Parisa Sahebi

Graduation Semester and Year

2013

Language

English

Document Type

Thesis

Degree Name

Master of Science in Materials Science and Engineering

Department

Materials Science and Engineering

First Advisor

Efstathios Meletis

Abstract

Ferroelectric BaTiO₃(BTO) thin films were deposited on polycrystalline nickel disks and silicon wafer substrates by rf magnetron sputtering. Nickel oxide (NiO) and nanocrystalline nickel (nc-Ni) layers were used as interfacial buffer layers. Microstructural studies with X-ray diffraction and transmission electron microscopy reveal that the BTO films deposited at temperatures lower than 700℃ have an amorphous structure. However, the BTO films sputtered at temperatures higher than 700℃ are partially crystalline. BTO films have a good and continuous interface with both interfacial layers with no interdiffusion or reaction with the substrates. In the case of BTO deposition with nc-Ni interlayer at higher deposition temperature of 800℃, a thin NiO layer forms between the nc-Ni and BTO films. Having nc-Ni as an interfacial layer enhances surface morphology and decreases surface roughness. This study shows that nc-Ni can act as a proper interfacial layer between a ceramic like BTO and the metallic substrates and is a better alternative for NiO buffer layer.

Disciplines

Engineering | Materials Science and Engineering

Comments

Degree granted by The University of Texas at Arlington

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